Sputtering system, sputtering support system and sputtering control method

摘要

The present invention is characterized by; detecting the volume of impurities in said vacuum vessel wherein plasma is generated by radio frequency power supplied to the target electrode and substrate electrode, and a target is sputtered by ions in said plasma, thereby forming films on the substrate, and controlling the phase difference of radio frequency power supplied to each of said electrodes according to said detection value.