| 摘要 |
PURPOSE: Provided is an antireflective coating composition obtained by the addition of a basic material to an antireflective composition to significantly decrease or even completely eliminate notching of an overcoated photoresist relief image. Therefore, the antireflective compositions can be effectively used at a variety of wavelengths used to expose an overcoated photoresist layer, including 248nm and 193nm. CONSTITUTION: The antireflective coating composition comprises a basic material and a crosslinking agent. A coated substrate comprises: an antireflective composition layer containing the basic material and crosslinking agent; and a photoresist layer on the antireflective composition layer, wherein the basic material has a pKa of about 3 or more, contains one or more of N, O, S, amine group, hydroxy, ether and sulfide, and has a molecular weight of about 500 or less.
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