| 摘要 |
A polymer for a photoresist composition is given by the formula (I): wherein R1 is a hydrogen atom or a methyl group, R2 is a C1-12 linear or branched alkyl, haloalkyl or alkoxycarbonyl group, a C5-12 cyclic alkyl, cyclic haloalkyl or cyclic alkoxycarbonyl group, a phenyl group or a naphthyl group, R3 is a C1-12 linear or branched alkyl or haloalkyl group, a C5-12 cyclic alkyl or cyclic haloalkyl group, a phenyl group, or a naphthyl group, R4 and R5 are independently a hydrogen atom, a C1-6 linear or branched alkyl, or a C5-6 cyclic alkyl group, R' and R'' are independently a hydrogen atom, a halogen atom, a C1-8 alkyl or alkoxy group, a hydroxy group, a carbonate group or a phenyl group, and m, n, p and q are independently an integer provided that m and q are not zero, at least one of n and p are not zero, 0.4<=m/(m+n+p+q)<=0.9, 0<=n/(m+n+p+q)<=0.5, 0<=p/(m+n+p+q)<=0.5, and 0.01<=q/(m+n+p+q)<=0.3
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