发明名称 |
Vapor deposition temperature control apparatus and method |
摘要 |
Coating temperature during vapor deposition of a ceramic coating on a substrate in a coating box or enclosure is maintained by means of a heat release cover or lid on the coating enclosure and movable in response to temperature in the coating enclosure exceeding a predetermined value so as to release excess heat from the enclosure to maintain coating temperature within an appropriate range.
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申请公布号 |
US2002015788(A1) |
申请公布日期 |
2002.02.07 |
申请号 |
US20010965432 |
申请日期 |
2001.09.27 |
申请人 |
HOWMET RESEARCH CORPORATION |
发明人 |
CALLAWAY MARTIN A.;ADAIR ROBERT D.;MURPHY KENNETH S.;MANIURSKI THEODORE J. |
分类号 |
C23C14/54;(IPC1-7):C23C16/00 |
主分类号 |
C23C14/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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