发明名称 PLASMA COATING METHOD
摘要 <p>The invention concerns in particular a method for using low pressure plasma to deposit a coating on an object to be treated, whereby the plasma is obtained by partially ionising, under the action of an electromagnetic field, a reaction fluid injected under low pressure into a treatment zone. The invention is characterised in that the method comprises at least two steps: a first step during which the reaction fluid is injected into the treatment zone at a first flow rate and under a given pressure, and a second step during which the same reaction fluid is injected into the treatment zone at a second flow rate lower than the first.</p>
申请公布号 WO2002010474(A1) 申请公布日期 2002.02.07
申请号 FR2001002406 申请日期 2001.07.24
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