| 摘要 |
Disclosed is a position detecting method and position detecting system for measuring a position of a pattern formed on an object to be observed, for use in an exposure apparatus. The method includes providing incoherence-transformed illumination light for illuminating the pattern surface of the object by use of coherent light, and incoherence-transformed reference light, changing the quantity of the reference light in accordance with a reflection factor of the pattern surface, and imaging reflection light from the pattern surface and reference light reflected by a conjugate mirror, together, upon a photoelectric converting element, and measuring the position of the pattern on the basis of an interference image signal obtainable by the imaging.
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