| 摘要 |
The present invention provides a semiconductor device comprising: a semiconductor body having grooves, unit cell regions surrounded by the grooves, at least a field relaxation region separated by the grooves from the unit cell regions; gate insulating films extending within the grooves and over the field relaxation regions; gate electrodes extending over the gate insulating film; inter-layer insulators covering the gate electrodes; and a top electrode extending over the inter-layer insulators and in contact with parts of the unit cell regions, and the top electrode having a generally flat upper surface.
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