| 摘要 |
<p>An object of the present invention is to provide a quartz glass jig, which, when employed in a processing apparatus using plasma, is less in generation of abnormal etching and particles and low in contamination with impurities. This object is obtained by a quartz glass jig for a processing apparatus using plasma, wherein a surface of the jig is subjected to grinding or a sandblast processing and has a surface roughness Ra in the range of from 2 νm to 0.05 νm, and microcracks of grinding marks formed during the grinding or sandblast processing have a depth of 50 νm or less.</p> |
