发明名称 Substrate-processing apparatus
摘要 A substrate-processing apparatus comprising a processing chamber in which a substrate is processed, an air-supplying device for supplying air having controlled temperature and humidity into the processing chamber, an air passage having an inlet port and an outlet port connected to the processing chamber, for guiding the air from the inlet port to the outlet port, a cooling/dehumidifying section arranged in the air passage and having a thermoelectric cooling device, for cooling and dehumidifying the air introduced from the inlet port, a heating section arranged in the air passage, for heating the air that has been cooled and dehumidified by the cooling/dehumidifying section, a humidifying section provided in the air passage, for humidifying the air heated by the heating section and guiding the air to the outlet port, a temperature-humidity sensor provided at a position in the air passage, and a control device for controlling the cooling/dehumidifying section, the heating section and the humidifying section, in accordance with temperature and humidity detected at the position in the air passage, thereby to adjust the temperature and humidity of the air to be supplied from the outlet port.
申请公布号 US2002014084(A1) 申请公布日期 2002.02.07
申请号 US20010916342 申请日期 2001.07.30
申请人 KANEDA MASATOSHI;AKIMOTO MASAMI;JINNAI NOBUYUKI 发明人 KANEDA MASATOSHI;AKIMOTO MASAMI;JINNAI NOBUYUKI
分类号 H05K3/00;G03F7/30;H01L21/00;H01L21/027;(IPC1-7):F25D17/04;F25B49/00 主分类号 H05K3/00
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