发明名称 |
FINE PATTERN DRAWING METHOD |
摘要 |
A fine pattern drawing apparatus for drawing a fine pattern directly in ink with high precision, a method for fabricating a fine nozzle that such a fine pattern drawing apparatus has, and a method for drawing a fine pattern are disclosed. The fine pattern drawing apparatus comprises a silicon base, fine holes extending through the silicon base from its front surface to its back surface and having silicon oxide layers on their walls, fine nozzles projecting from the back surface of the silicon base and extending from the openings of the fine holes integrally with the silicon oxide layers, silicon nitride layers formed on the front and side surfaces of the silicon base, a support member provided to the front surface of the silicon base, an ink passage for supplying ink to the openings of the fine holes in the front surface, and an ink supply connected to the ink passage. |
申请公布号 |
WO0211182(A2) |
申请公布日期 |
2002.02.07 |
申请号 |
WO2001JP06353 |
申请日期 |
2001.07.23 |
申请人 |
DAI NIPPON PRINTING CO., LTD.;FUJITA, HIROYUKI;MITA, YOSHIO;OHIGASHI, RYOICHI;TSUCHIYA, KATSUNORI |
发明人 |
FUJITA, HIROYUKI;MITA, YOSHIO;OHIGASHI, RYOICHI;TSUCHIYA, KATSUNORI |
分类号 |
B41J2/135;B05B1/14;B05B5/025;B05C5/00;B05C5/02;B05C11/10;B05D1/04;B05D1/26;B41J2/02;G02B5/20;G02F1/1335;G02F1/1345;H01L21/027;H01L51/00;H01L51/40 |
主分类号 |
B41J2/135 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|