发明名称 |
PROCESS FOR MAKING A PERIODIC PROFILE |
摘要 |
A first layer of photoresist material, sensitive to radiation of a first wavelength, has a second layer of photoresist material, sensitive to radiation of a second wavelength, deposited thereon. A pattern of radiation of the second wavelength is then formed on the second layer of photoresist material which is subsequently treated with a solvent, in which the first layer of photoresist material is insoluble, to develop a first periodic profile. The first layer of photoresist material is then exposed to radiation of the first wavelength through the first periodic profile and treated to develop a second periodic profile. By directing the radiation of the second wavelength through the first periodic profile a an angle to normal to the first photoresist material a blaze profile may be obtained. |
申请公布号 |
WO0210857(A2) |
申请公布日期 |
2002.02.07 |
申请号 |
WO2001GB03305 |
申请日期 |
2001.07.25 |
申请人 |
QINETIQ LIMITED;BRYAN-BROWN, GUY, PETER;WOOD, EMMA, LOUISE |
发明人 |
BRYAN-BROWN, GUY, PETER;WOOD, EMMA, LOUISE |
分类号 |
G03F7/00;G03F7/095 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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