发明名称 MULTIPLE-SOURCE ARRAYS FOR CONFOCAL AND NEAR-FIELD MICROSCOPY
摘要 <p>A multiple-source array for illuminating an object including: a source of electromagnetic radiation having a wavelength μ in vacuum; and a reflective mask positioned to receive the electromagnetic radiation, the reflective mask comprising an array of spatially separated apertures, wherein each aperture comprises a dielectric material defining a waveguide having transverse dimensions sufficient to support one or more guided propagating modes of the electromagnetic radiation extending through the mask, each aperture configured to radiate a portion of the electromagnetic radiation to the object.</p>
申请公布号 WO2002010830(A2) 申请公布日期 2002.02.07
申请号 US2001023746 申请日期 2001.07.27
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