发明名称 POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION AND POSITIVE-TYPE PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE
摘要 PROBLEM TO BE SOLVED: To provide a positive-type photosensitive composition containing an o-naphthoquinonediazido compound, which is superior in contrast of image and non-image areas, ensuring high-contrast gradation and no blurring of a print by ink jet printing and having proper suitability to coating as a coating liquid, and to provide a positive-type photosensitive planographic printing plate using the composition. SOLUTION: The positive-type photosensitive composition contains (A) a compound containing an o-naphthoquinonediazido group, (B) an alkali-soluble resin and (C) a fluorine-containing surfactant having <=10 wt.% fluorine content. The positive-type photosensitive planographic printing plate is obtained, by forming a layer of the photosensitive composition on the surface of a substrate.
申请公布号 JP2002040637(A) 申请公布日期 2002.02.06
申请号 JP20000223269 申请日期 2000.07.25
申请人 MITSUBISHI CHEMICALS CORP 发明人 MOTOMI KATSUKO
分类号 G03F7/004;C08K5/00;C08K5/28;C08L101/12;G03F7/00;G03F7/022;G03F7/032;H01L21/027 主分类号 G03F7/004
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