METHOD AND APPARATUS FOR PRETREATMENT FOR ANALYSIS OF IMPURITIY ON SURFACE OF SEMICONDUCTOR

摘要

PROBLEM TO BE SOLVED: To provide a method and an apparatus, for a pretreatment of impurities analysis on the surface of a semiconductor, where the impurities in a prescribed place on a semiconductor wafer can be collected, by preventing creepage of contamination from the air and humans. SOLUTION: A collection tube 10, which has a lid 15 on the bottom face 13 of a cylindrical body 14 and on which a plurality of cutouts 11 are formed in the cylindrical body 14 by a prescribed distance from the bottom face 13, is used. The collection tube 10 is pressed to the surface of the semiconductor; respective pieces 12 in the lower part of the collection tube are expanded from the cutouts 12; a medium which contains the impurities on the surface of the semiconductor is collected from their gaps 16; the collection tube is lifted; and the lid 15 is closed.