发明名称 DEPOSITION SHIELD AND VACUUM FILM-FORMATION EQUIPMENT THEREWITH
摘要 PROBLEM TO BE SOLVED: To provide a more effective deposition shield which can be mounted easily without requiring much labor and time, and be stored without needing a wide space. SOLUTION: The deposition shield 21 for shielding a location other than a work-piece placed inside a body of an apparatus (such as a wall) from deposition of vaporized material, comprises being formed from a thin roll-shaped plate, having a concave or convexoconcave configuration on its surface 22 for preventing a film exfoliation, and consisting of an aluminum material of which the melting point is lower than that of the vaporized material.
申请公布号 JP2002038253(A) 申请公布日期 2002.02.06
申请号 JP20000223990 申请日期 2000.07.25
申请人 FUTABA CORP;ULVAC JAPAN LTD 发明人 SHIMIZU HIDEYUKI;KANESHIGE TOSHIO;NISHIMURA NORIO;WATANABE TERUO;MIKAMI SHUN
分类号 C23C14/00;C23C16/44;H01L21/203;(IPC1-7):C23C14/00 主分类号 C23C14/00
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