发明名称 |
DEPOSITION SHIELD AND VACUUM FILM-FORMATION EQUIPMENT THEREWITH |
摘要 |
PROBLEM TO BE SOLVED: To provide a more effective deposition shield which can be mounted easily without requiring much labor and time, and be stored without needing a wide space. SOLUTION: The deposition shield 21 for shielding a location other than a work-piece placed inside a body of an apparatus (such as a wall) from deposition of vaporized material, comprises being formed from a thin roll-shaped plate, having a concave or convexoconcave configuration on its surface 22 for preventing a film exfoliation, and consisting of an aluminum material of which the melting point is lower than that of the vaporized material.
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申请公布号 |
JP2002038253(A) |
申请公布日期 |
2002.02.06 |
申请号 |
JP20000223990 |
申请日期 |
2000.07.25 |
申请人 |
FUTABA CORP;ULVAC JAPAN LTD |
发明人 |
SHIMIZU HIDEYUKI;KANESHIGE TOSHIO;NISHIMURA NORIO;WATANABE TERUO;MIKAMI SHUN |
分类号 |
C23C14/00;C23C16/44;H01L21/203;(IPC1-7):C23C14/00 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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