| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist exposure device, capable of forming arbitrary patterns without using a mask, applying very small corrections within the same patterns, preventing cellularization of the patterns and making utilization of light effective. SOLUTION: This device has a light source 4; a substrate which is coated with photosensitive resist on its front surface; a DLP element 5, which is integrated with multiple sheets of very small micromirrors and switches the inclinations of the individual micromirrors to two directions according to digital input signals and an exposure control means 7, which outputs digital signals to the DLP element according to the prescribed exposure patterns, reflects part of the light of the light source toward the resist by the DLP element to expose the resist and reflects the remaining part of the light toward the areas exclusive of the resist. The inclinations of the respective micromirrors of the DLP element 5 are switched by the digital signals, by which the resist is exposed to a prescribed patterns. |
