发明名称 APPARATUS AND METHOD FOR PLASMA TREATMENT
摘要 PROBLEM TO BE SOLVED: To form a deposition film with superior uniformity of the film characteristics and restricted occurrence of a picture failure. SOLUTION: This apparatus comprises a base body cap 107 having a flange part 118 with an external diameter wider than that of a cylindrical base body 105, which supports the cylindrical base body 105 for forming a deposition film, and a dashboard 113 arranged at a distance d from the surface of a lower part 119 of the base body cap without touching, in a reaction vessel. The dashboard 113 is arranged at the lower part 119 of the base body cap, so as not to influence the deposition film deposited on the surface of the cylindrical base body 105, and so that film pieces which are exfoliated from the main body of the base body cap 107 and the flange part 118, can not scatter toward the cylindrical base body 105. The distance d is set at intervals which do not obstruct a formation of a sheath on the surface of the base body cap 107 and which are hard for the film pieces to pass. The dashboard 113 divides a glow discharge generating in the reaction vessel 101 into two of a first discharge region 116 and second discharge region 117.
申请公布号 JP2002038273(A) 申请公布日期 2002.02.06
申请号 JP20000223762 申请日期 2000.07.25
申请人 CANON INC 发明人 HOSOI KAZUTO;AKIYAMA KAZUYOSHI;OTSUKA TAKASHI;SHIRASAGO TOSHIYASU
分类号 H05H1/46;C23C16/507;G03G5/08 主分类号 H05H1/46
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