| 摘要 |
PURPOSE: An exposure method, an exposure apparatus and a method for preparing a device by using the exposure method are provided, to allow the exposed surface of a photosensitive substrate to be put in high precision and high speed to the reference surface. CONSTITUTION: The exposure method comprises the step of moving a second body to the exposure beam passed through a projection system with the synchronized moving of a first body to an exposure beam, thereby exposing the second body, wherein the position information of the second body to the optical axis direction of the projection system is detected before the second body is exposed by the exposure beam; the first body and the second body are moved synchronously and independently for exposure; and the position relation between the upper face of the projection system and the second body is adjusted based on the detected position information during the synchronous moving of the first and second bodies.
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