发明名称 CONSECUTIVE PATTERN-PLATING METHOD FOR METAL STRIP AND EQUIPMENT, AND METAL STRIP PRODUCT PATTERN-PLATED THEREBY
摘要 PROBLEM TO BE SOLVED: To provide a metal plating method and an equipment which are superior in plating-position accuracy in a consecutive pattern-plating process on metal strip. SOLUTION: The consecutive pattern-plating method by means of winding metal strip on an outer circumferential wall of a rotary drum, is characterized by that the outer circumferential wall of the drum is stuck by a metallic ring which is provided with a porous electrode in a plating-liquid distribution groove, and a masking member which is provided with a desired slit on an external surface of the ring so as to communicate with the plating-liquid distribution groove of the ring, and that the plating-liquid is introduced to the plating-liquid distribution groove of the outer circumferential wall after being supplied into the inside of the drum and is brought into contact with the metal strip in a region of the slit in the masking member of the outer circumferential wall of the drum to plate the pattern.
申请公布号 JP2002038294(A) 申请公布日期 2002.02.06
申请号 JP20000225955 申请日期 2000.07.26
申请人 FURUKAWA ELECTRIC CO LTD:THE 发明人 KIMURA HARUNOBU;SUZUKI SATOSHI
分类号 C25D5/02;(IPC1-7):C25D5/02 主分类号 C25D5/02
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