发明名称 |
CONSECUTIVE PATTERN-PLATING METHOD FOR METAL STRIP AND EQUIPMENT, AND METAL STRIP PRODUCT PATTERN-PLATED THEREBY |
摘要 |
PROBLEM TO BE SOLVED: To provide a metal plating method and an equipment which are superior in plating-position accuracy in a consecutive pattern-plating process on metal strip. SOLUTION: The consecutive pattern-plating method by means of winding metal strip on an outer circumferential wall of a rotary drum, is characterized by that the outer circumferential wall of the drum is stuck by a metallic ring which is provided with a porous electrode in a plating-liquid distribution groove, and a masking member which is provided with a desired slit on an external surface of the ring so as to communicate with the plating-liquid distribution groove of the ring, and that the plating-liquid is introduced to the plating-liquid distribution groove of the outer circumferential wall after being supplied into the inside of the drum and is brought into contact with the metal strip in a region of the slit in the masking member of the outer circumferential wall of the drum to plate the pattern.
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申请公布号 |
JP2002038294(A) |
申请公布日期 |
2002.02.06 |
申请号 |
JP20000225955 |
申请日期 |
2000.07.26 |
申请人 |
FURUKAWA ELECTRIC CO LTD:THE |
发明人 |
KIMURA HARUNOBU;SUZUKI SATOSHI |
分类号 |
C25D5/02;(IPC1-7):C25D5/02 |
主分类号 |
C25D5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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