| 摘要 |
PROBLEM TO BE SOLVED: To provide an optical additional film (a reflecting film, an antireflection film or a protective film) and an optical element usable in F2 laser lithography. SOLUTION: Each of the optical additional film and the optical element for F2 laser lithography has at least a thin film of fluorine-containing quartz. An optical device for F2 laser lithography using the optical additional film such as a reflecting film or an antireflection film or the optical element is provided. |
