发明名称 PHOTO-CURING RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a photo-curing resin composition, capable of giving high performance cured film of superior moisture and heat and resistances, adhesion, mechanical and electrical characteristics and suitable for use in the production of a printed wiring board, a high density multilayer sheet, a semiconductor package, etc., and to provide a photosensitive element obtained by disposing a layer of the photo-curing resin composition on a base and giving a cured film having superior moisture and heat resistances, adhesion, mechanical characteristics and electrical insulating property. SOLUTION: The photo-curing resin composition contains an acid modified vinyl-containing epoxy resin (A), an elastomer (B), a photopolymerization initiator (C), a diluent (D) and a curing agent (E) as essential components. The elastic modulus of a cured film of the composition in the measurement of dynamic viscoelasticity in the range of 200-220 deg.C is 1-100 MPa.
申请公布号 JP2002040657(A) 申请公布日期 2002.02.06
申请号 JP20010159536 申请日期 2001.05.28
申请人 HITACHI CHEM CO LTD 发明人 SATO KUNIAKI;HIRAKURA HIROAKI;ITO TOSHIHIKO;HIRAYAMA TAKAO;YOSHINO TOSHIZUMI
分类号 G03F7/038;B32B27/38;C08F2/44;C08F2/50;C08F290/06;C08F299/02;C08G59/16;C08L63/00;C08L101/00;H01L21/027 主分类号 G03F7/038
代理机构 代理人
主权项
地址