| 摘要 |
PROBLEM TO BE SOLVED: To form plural light diffusing films having high stability and uniform diffusing performance in respective substrates on a large sized mother board by a photolithographic method. SOLUTION: In a method for manufacturing the light diffusing film 15 wherein the light diffusing film 15 is formed by the photolithographic method to a photosensitive resin layer 11 formed on the mother board 10, the photosensitive resin layer 11 is exposed by using a photo mask 8 having a central part opening part 14 whose numerical aperture is specified to be (L-2x.tanA)/L times ±10% of the numerical aperture of the peripheral part opening part 13. |
