发明名称 |
Liquid crystal display and method of manufacturing the same |
摘要 |
A semiconductor device includes a substrate and a first layer of a first conductive material on the substrate, the first layer having a first etching rate. A second layer of a second conductive material has a first hole on a portion of the first layer, the second layer having a second etching rate higher than the first etching rate. A third layer includes a combination of the first and second layers between the first and the second layers, the third layer having a third etching rate lower than the second etching rate. An insulating layer has a second hole on the third layer, the insulating layer having a fourth etching rate higher than the first etching rate. A transparent conductive layer is on the third layer through the first and second holes.
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申请公布号 |
US6344377(B2) |
申请公布日期 |
2002.02.05 |
申请号 |
US20010880829 |
申请日期 |
2001.06.15 |
申请人 |
LG. PHILIPS LCD CO., LTD. |
发明人 |
AHN BYUNG CHUL;SEO HYUNG SIK;SOH HOE SUP;KIM CHANG DONG;CHOI JAE BEOM;YUN DUK CHUL |
分类号 |
G02F1/1362;H01L21/77;H01L21/84;H01L27/12;H01L29/49;(IPC1-7):H01L21/84 |
主分类号 |
G02F1/1362 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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