| 摘要 |
PROBLEM TO BE SOLVED: To prevent permeation of slurry into a base layer of a polishing pad by providing a waterproofing layer on a peripheral side surface of the base layer, and thereby prevent adversary influences on polishing property and to improve detecting accuracy of a polishing rate. SOLUTION: This polishing pad 1 is provided with the base layer 11 and a pad body 10 laminated on a surface of the base layer 11. The waterproofing layer 12 is provided on a peripheral side surface of the base layer 11. A groove part 13 may be formed on a surface of a surface plate side of the base layer 11. |
