发明名称 Arc coating on mask quartz plate to avoid alignment error on stepper or scanner
摘要 A new method and apparatus is provide whereby light diffusion within the light measurement toll has been eliminated. A layer of Anti Reflective Coating is deposited on the outside of the second surface of a quartz mask thereby preventing light that is reflected internally to the quartz mask from exiting the mask. All reflected light is therefor eliminated and, with that, the source of light diffusion is eliminated.
申请公布号 US6344365(B1) 申请公布日期 2002.02.05
申请号 US20000578411 申请日期 2000.05.26
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY 发明人 SHENG HAN-MING;KUO CHENG-CHEN
分类号 G03F9/00;H01L21/68;(IPC1-7):G01R21/66;H01L21/00 主分类号 G03F9/00
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