发明名称 A method for forming an antifuse
摘要 According to the preferred embodiment, an antifuse structure and method for personalizing a semiconductor device is provided that overcomes the limitations of the prior art. The preferred embodiment antifuse comprises a two layer transformable insulator core between two electrodes. The transformable core is normally non-conductive but can be transformed into a conductive material by supplying a sufficient voltage across the electrodes. The two layer core preferably comprises an injector layer and a dielectric layer. The injector layer preferably comprises a two phase material such as silicon rich nitride or silicon rich oxide. Initially, the injector layer and dielectric layer are non-conductive. When a sufficient voltage is applied the core fuses together and becomes conductive.
申请公布号 US6344373(B1) 申请公布日期 2002.02.05
申请号 US19980106980 申请日期 1998.06.29
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BHATTACHARYYA ARUP;GEFFKEN ROBERT M.;LAM CHUNG H.;LEIDY ROBERT K.
分类号 H01L21/82;H01L23/525;(IPC1-7):H01L21/82 主分类号 H01L21/82
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