发明名称 Method for fabricating detection element and method for fabricating two-dimensional image detector using detection element
摘要 In a method of the present invention for fabricating a two-dimensional image detector in which a light/radiations detection element is applied, an upper electrode, a first charge blocking layer, and a semiconductor layer having photoconductivity are provided on support substrate in the stated order, and thereafter, a surface of the semiconductor layer is sprayed with ceramic particles by means of an abrasive grain jet nozzle. The abrasive grain jet nozzle repeatedly makes a high-speed reciprocating motion in an X direction at constant cycles while jetting the ceramic particles to the entirety of the surface of the semiconductor layer of the counter substrate moving in a Y direction, so that the surface of the semiconductor layer is subjected to a flattening treatment. This enables to provide a two-dimensional image detector in which a light/radiations detection element that provides effective improvement of a charge blocking effect and suppression of deterioration of reliability is applied.
申请公布号 US6344370(B1) 申请公布日期 2002.02.05
申请号 US20000543673 申请日期 2000.04.06
申请人 SHARP KABUSHIKI KAISHA;SHIMADZU CORPORATION 发明人 IZUMI YOSHIHIRO;TERANUMA OSAMU;SATO TOSHIYUKI;TOKUDA SATOSHI;YOSHIMUTA TOSHINORI
分类号 H01L31/09;H01L27/14;H01L27/146;(IPC1-7):H01L21/00 主分类号 H01L31/09
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