发明名称 Method for manufacturing a semiconductor device having a conductor pattern side face provided with a separate conductive sidewall
摘要 It is possible to obtain a semiconductor device in which a contact and a wiring provided on the contact can be electrically connected well even if a shift of superposition is caused. Sidewalls 5a, 5b, 5c and 5d formed of a conductive material directly making contact with side faces of wirings 4a and 4b to be provided on contacts 3a and 3b. Consequently, the wirings 4a and 4b and the contacts 3a and 3b can be electrically connected well through the sidewalls 5a, 5b, 5c and 5d.
申请公布号 US6344406(B2) 申请公布日期 2002.02.05
申请号 US20010843728 申请日期 2001.04.30
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 TOMITA KAZUO
分类号 H01L21/768;H01L21/8242;H01L21/8246;H01L27/105;H01L27/108;(IPC1-7):H01L27/108 主分类号 H01L21/768
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