| 摘要 |
PURPOSE: A stripping method is provided to remove antireflective compositions from a substrate using compositions. CONSTITUTION: An antireflective composition is contacted with a stripping composition for a period of time to remove the antireflective composition. The stripping composition comprises one or more polar aprotic solvents and one or more aggressive bases. The polar aprotic solvent is selected from dimethyl sulfoxide or sulfolane. The polar aprotic solvent is present in an amount in the range of about 10 to about 99.9 %wt, based on the total weight of the stripping composition.
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