发明名称
摘要 PURPOSE:To make a high-speed drying air flow to effectively act on a resist to be dried so as to effectively utilize infrared energy by providing air flow limiting plates closely to the surface of a substrate to be processed in a drying device and limiting the passage of the drying air flow to the vicinity of the substrate. CONSTITUTION:An infrared heating device 2 is provided in a drying device 1 and substrates 4 with applied resists 3 are continuously fed to the device 2. Air flow limiting plates 5 are provided closely to the substrates 4. Therefore, a drying air flow passes through the space between the plates 5 and substrates 4 and efficiently removes a solvent from the resist. In addition, when the plates 5 are formed of a heat resisting infrared-ray transmitting material, the resist can be effectively irradiated with radiation for heating.
申请公布号 JP3253691(B2) 申请公布日期 2002.02.04
申请号 JP19920231170 申请日期 1992.08.31
申请人 发明人
分类号 B05D3/02;G03F7/16;G03F7/38;H01L21/027;(IPC1-7):H01L21/027 主分类号 B05D3/02
代理机构 代理人
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