发明名称 SYSTEM FOR PROCESSING SEMICONDUCTOR SUBSTRATE
摘要 PURPOSE: A system for processing a semiconductor substrate is provided to eliminate the need for a position control unit for centering a wafer, by making a transfer robot reciprocate between a process unit for processing the wafer and a cassette receiving the wafer before and after the wafer is processed by the process unit. CONSTITUTION: A plurality of semiconductor substrates are received in at least one cassette(200a,200b). A plurality of process units(300a,300b,300c,300d) process the plurality of semiconductor substrates received in the cassette. The transfer robot(100) reciprocates between the cassette and the plurality of process units, directly transferring the semiconductor substrate.
申请公布号 KR20020009656(A) 申请公布日期 2002.02.02
申请号 KR20000042974 申请日期 2000.07.26
申请人 K.C. TECH CO., LTD. 发明人 CHO, JU HWAN;HA, SANG SU;KIM, JUNG GWAN;KO, SE JONG;LEE, JEONG HO
分类号 H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/68
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