METHOD FOR SIMULATING PLASMA PROCESS

摘要

PURPOSE: A method for simulating a plasma process is provided to optimize a plasma process according to a variation of plasma process and extract a physical model set of a surface from a simulation process. CONSTITUTION: Kinds of ions and an energy distribution function are obtained according to variation of a plasma process by performing a plasma simulation process. A sputter yield function is obtained according to incident ions by performing a molecular dynamic simulation process. A configuration simulation surface model parameter is obtained by combining the energy distribution function obtained from the plasma simulation process with a value of the surface reaction parameter obtained from the molecular dynamic simulation process. A surface configuration is obtained by performing the simulation using the surface reaction parameter.