发明名称 PROCEDE DE TRAITEMENT DE NANOSTRUCTURES ET DISPOSITIF DE TRAITEMENT DE NANOSTRUCTURES
摘要 <p>The invention concerns a method for generating nanostructures to obtain on a zone of a metal workpiece (10) a nanostructure layer with a specific thickness, characterised in that it comprises: a step which consists in shot peening on an impact point of the zone of the surface of the workpiece (10) to be treated, for a specific time interval, at a specific speed and under variable angles of incidence at the same impact point a specific quantity of perfectly spherical balls (22), having specific dimensions and being permanently re-used during the shot peening; repeating the preceding step by displacing the impact point so that the whole set of impact points covers the entire surface of the workpiece to be treated; a step which consists in treating by diffusion of chemical compounds in the nanostructure layer produced during the nanostructure generating step.</p>
申请公布号 FR2812285(A1) 申请公布日期 2002.02.01
申请号 FR20000009950 申请日期 2000.07.28
申请人 UNIVERSITE DE TECHNOLOGIE DE TROYES 发明人 LU JIAN;LU KE
分类号 C21D7/06;C23C8/02;(IPC1-7):B82B3/00;C23C8/32;B24C1/10;C23C8/22;C23C8/00;B24C5/08;C23C8/26 主分类号 C21D7/06
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