VAPORIZER FOR SUPPLYING GAS TO CVD CHAMBER

摘要

PURPOSE: A vaporizer for supplying gas to a CVD(Chemical Vapor Deposition) chamber is provided to improve efficiency of a CVD chamber by supplying smoothly a gas to the CVD chamber. CONSTITUTION: A liquid source supply portion(110) has a liquid source supply tube(111). The liquid source supply tube(111) has a small inside diameter. A plurality of cooling tube(112a,112b) is arranged around the liquid source supply tube(111). The cooling tubes(112a,112b) are used for supplying or exhausting a cooling gas such as air or an N2 gas or an Ar gas. The liquid source supply tube(111) is connected with a vaporization portion(120) through a heat-sink plate(113). The vaporization portion(120) has a vaporization tube(121). The inside diameter of the vaporization tube(121) is larger than the inside diameter of the liquid source supply tube(111). An internal heater(122) is arranged around the vaporization tube(121). A gas source supply portion(130) has a gas source supply tube(131) connected with the vaporization tube(121).