发明名称 POSITION-MEASURING INSTRUMENT AND ALIGNER
摘要 PROBLEM TO BE SOLVED: To provide a position-measuring instrument which can shorten measuring time, and at the same time, can detect positional information with high accuracy and, to provide an aligner. SOLUTION: The position measuring instrument, which measures the positional information on a mark formed on an object, is provided with an FIA-type alignment sensor 30, which detects the first detected information regarding the positional information on the mark by using a first detection system, an LIA-type alignment sensor 31 which detects the second detected information regarding the positional information on the mark by using a second detection system which is different from the first detection system, and a computing means which calculated the positional information on the mark by reflecting the detected information detected by means of either one 30 or 31 of the alignment sensors in the detected information detected by means of the other sensor 31 or 30.
申请公布号 JP2002033256(A) 申请公布日期 2002.01.31
申请号 JP20000215123 申请日期 2000.07.14
申请人 NIKON CORP 发明人 NAKAJIMA SHINICHI
分类号 G01B11/00;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G01B11/00
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