发明名称 SEMICONDUCTOR SUBSTRATE, METHOD FOR DISCRIMINATING THE SAME, AND METHOD FOR MANUFACTURING THE SUBSTRATE
摘要 <p>PROBLEM TO BE SOLVED: To provide a semiconductor substrate from which an identification code can be detected readily, even if the substrate is an SOI substrate. SOLUTION: An SOI substrate W2 is constituted, by forming a silicon oxide film 22 on a bulk silicon layer 23 and on an active silicon layer 21 used for forming a circuit pattern on the oxide film 22. An identification code pattern 30 is formed in the interface between the bulk silicon layer 23 and silicon oxide film 22. Consequently, the identification code pattern 30 is not erased by polishing, etc., in succeeding processes, and the identification code of the substrate W2 can be detected easily. Therefore, the SOI substrate W2 can be discriminated through sure detection of the identification code by easily transmitting, for example, X-rays through the substrate W2.</p>
申请公布号 JP2002033250(A) 申请公布日期 2002.01.31
申请号 JP20000215490 申请日期 2000.07.17
申请人 MITSUBISHI ELECTRIC CORP 发明人 MUKOGAWA YASUKAZU
分类号 H01L27/12;H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L27/12
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