发明名称 Thin film formation use sputtering target material, thin film formed using same, and optical recording medium
摘要 An alloy material, a thin film and an optical recording medium to achieve various tasks such as maintenance of a high reflectivity, improved corrosion resistance, simplified production of the alloy, and realization of stability and simplicity/easiness of a sputtering process when being used as a sputtering target. An AgPd alloy including Ag as a main component and Pd in the range of 0.5 to 4.9 atomic % is used as a thin film formation use sputtering target material, with the target material a thin film, that is a reflecting film, constituting an optical recording medium is formed and the optical recording medium containing the reflecting film as a constituent is produced.
申请公布号 US2002012604(A1) 申请公布日期 2002.01.31
申请号 US20000569728 申请日期 2000.05.10
申请人 ARATANI KATSUHISA;UENO TAKASHI 发明人 ARATANI KATSUHISA;UENO TAKASHI
分类号 C22C5/06;C22C5/08;C23C14/14;C23C14/34;G11B7/258;G11B7/26;(IPC1-7):C22C5/06;B32B3/02 主分类号 C22C5/06
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