发明名称 |
Thin film formation use sputtering target material, thin film formed using same, and optical recording medium |
摘要 |
An alloy material, a thin film and an optical recording medium to achieve various tasks such as maintenance of a high reflectivity, improved corrosion resistance, simplified production of the alloy, and realization of stability and simplicity/easiness of a sputtering process when being used as a sputtering target. An AgPd alloy including Ag as a main component and Pd in the range of 0.5 to 4.9 atomic % is used as a thin film formation use sputtering target material, with the target material a thin film, that is a reflecting film, constituting an optical recording medium is formed and the optical recording medium containing the reflecting film as a constituent is produced. |
申请公布号 |
US2002012604(A1) |
申请公布日期 |
2002.01.31 |
申请号 |
US20000569728 |
申请日期 |
2000.05.10 |
申请人 |
ARATANI KATSUHISA;UENO TAKASHI |
发明人 |
ARATANI KATSUHISA;UENO TAKASHI |
分类号 |
C22C5/06;C22C5/08;C23C14/14;C23C14/34;G11B7/258;G11B7/26;(IPC1-7):C22C5/06;B32B3/02 |
主分类号 |
C22C5/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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