发明名称 |
SEMICONDUCTOR FABRICATING EQUIPMENT WITH ALIEN SUBSTANCE CLEANING DEVICE |
摘要 |
PURPOSE: A semiconductor fabricating equipment with an alien substance cleaning device is provided to remove alien substances or impurities from a wafer or a reticle. CONSTITUTION: An air injection portion(402) is connected with an air supply source(428). The air injection portion(402) has a regulator(426) for controlling a pressure of air supplied from the air supply source(428). The regulator(426) is operated manually or automatically by a sense signal from a sensor and a control signal from a control portion. The first solenoid valve(427) is arranged between the air supply source(428) and the regulator(426). Impurities passing the regulator(426) are filtered by a filter(425). The air passing the filter(425) is injected to a bottom of a wafer by an air shower(420). An alien substance absorption portion(401) is connected with a vacuum supply source(414). The alien substance absorption portion(401) is formed with a vacuum duct(410) and the second solenoid valve(412).
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申请公布号 |
KR20020008684(A) |
申请公布日期 |
2002.01.31 |
申请号 |
KR20000042686 |
申请日期 |
2000.07.25 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHO, JEONG HUI |
分类号 |
H01L21/304;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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