| 摘要 |
The multi-beam exposure apparatus includes a light source for emitting a specified number of multi-beams spaced apart in a direction of auxiliary scanning, a deflecting unit for deflecting the specified number of multi-beams collectively on main scanning lines by a specified number of deflections such that a space between adjacent ones of the specified number of multi-beams is exposed and a main scanning unit for performing main scan of a recording material as it is exposed with the specified number of multi-beams, wherein the space between adjacent ones of the specified number of multi-beams is an integral multiple of (the specified number of deflections +1) multiplied by a pitch of pixels in the direction of auxiliary scanning.
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