| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an electron beam inspection device capable of efficiently collecting the electrons reflected from a specimen and increasing the throughput of an inspection. SOLUTION: This electron beam inspection device comprises an electron beam radiation system having an objective lens for radiating the electron beam 14 from an electron source 13 to an expanded specified area zone on the surface of the specimen 1, a power supply 3 for applying a negative voltage to the specimen, an image forming means for forming an expanded image by focusing the reflected electrons obtained from the area radiated by the electron beam, and an image signal acquisition means for converting the expanded image formed by the image forming means to an image signal. The image obtained by the image signal acquisition means is compared with the image signal prepared by a design pattern to inspect for a defect.</p> |
