发明名称 RETICLE FOR MEASURING EFFECTIVE sigma AND METHOD FOR CALCULATING VARIATION IN EFFECTIVE sigma
摘要 <p>PROBLEM TO BE SOLVED: To provide a reticle for measuring effectiveσwhich accurately and easily measures variation inσwithin an exposure field. SOLUTION: A reticle 10 for measuring effectiveσcomprises a reticle main body 12 for measuring effectiveσand a light-shielding film 16 which is provided below a reticle main body and comprises a pin hole 14. The reticle main body comprises an effectiveσevaluating pattern at each field position provided in a specified arrangement. Related to each effectiveσevaluating pattern, a plurality of straight line patterns 22 radially extend outward from a pattern center 20 at equi-angle interval. Each straight pattern is provided with, with reading at the pattern center being 0, graduation from 0 to 1, or, graduation from 0 to maximumσ. The light-shielding film is provided with pin holes of the same arrangement and number with the effectiveσevaluating pattern. The light-shielding film is so provided below the reticle main body that the pin hole is positioned directly below the pattern center (graduation 0). The graduation pattern is so provided that a reading at a position across the graduation pattern of the reticle main body is x when the irradiation light emitted from a point light source corresponding toσ=x passes through the pin hole.</p>
申请公布号 JP2002033269(A) 申请公布日期 2002.01.31
申请号 JP20000218429 申请日期 2000.07.19
申请人 NEC CORP 发明人 FUJIMOTO TADASHI
分类号 G03F1/44;G03F1/68;G03F1/70;G03F7/20;H01L21/027;(IPC1-7):H01L21/027;G03F1/08 主分类号 G03F1/44
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