发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device and its manufacturing method which is made at a high density without having junctions or through-holes, compact and superior in reliability. SOLUTION: The semiconductor device is composed of an IC chip 1, a capacitor 2, a filter 3, an insulation chip holder 4 for holding these circuit components 1, 2, 3 together, and a circuit pattern 5 which is electrocast on the holder 4 surface and electrically connected to terminals of the circuit components 1, 2, 3. Metal posts 1a, 2a, 3a are electrocast respectively to the terminals of the circuit components 1, 2, 3 and connected with the circuit pattern 5. The manufacturing method comprises provisionally mounting the circuit components having the metal posts electrocast to the terminals on a base board, sealing the components with an insulation resin, polishing the resin to expose the metal posts on the surface, and electrocasting required circuit pattern between the exposed metal posts.
申请公布号 JP2002033437(A) 申请公布日期 2002.01.31
申请号 JP20000214881 申请日期 2000.07.14
申请人 HITACHI MAXELL LTD 发明人 FUKAO RYUZO;KISHIMOTO SEIJI;TOTTORI TAKESHI
分类号 H01L23/12;H01L21/56;H01L23/50;H01L23/52;H01L25/00;H01Q23/00;(IPC1-7):H01L25/00 主分类号 H01L23/12
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