| 摘要 |
<p>An aqueous composition for sandblast resist ink comprising an aqueous dispersible polymer having a minimum film-forming temperature of 10 DEG C or lower and a water-soluble polymer as a film-forming auxiliary agent, and a method of sandblasting using the aqueous composition are disclosed. The aqueous composition produces a sandblast resist ink which can produce a dry film having a degree of swelling in the range of 0.1-1.5 in water at 20 DEG C. The resist mask can be produced by using this aqueous composition as the sandblast resist ink without using any organic solvents in all steps (e.g. the resist mask formation step and the resist mask removed step) of sandblast processing for producing relief of photographic images, patterns, letters, or characters on the surface of glass, stones, ceramics, metals, plastics, woods, and the like. The sandblast resist ink exhibits surprising advantages as compared with conventional organic solvent type sandblast resist inks.</p> |
