| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and device for exhausting, as well as method and device for exposure, to remove, with a simple configuration, the gas containing light-absorbing material present in an optical-path space for precision and stable exposure process. SOLUTION: An exposure device RX comprises an exhausting device S which exhausts the light-absorbing material having such characteristics as absorbs exposure light PL present in a space SP formed between a projection optical system PL and a photosensitized plate P. The exhausting device S comprises exhausting mechanisms 1 provided at a plurality of positions between a position in the space SP which corresponds to a projection region AR by the projection optical system PL on the photosensitized board P and a position at the outer edge of the space SP, and a control device CONT which controls the exhausting mechanisms 1 for exhausting while the pressure at the outer edge is set higher relative to the position corresponding to the projection region AR.
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