发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To properly perform quality control, based on the number or density of defects in a semiconductor manufacturing process by using a plurality of sets of inspection equipment which have different inspection sensitivity. SOLUTION: The quality control is conducted properly, correcting the difference in inspection sensitivity for each equipment by finding in advance a relative correction factor at each equipment and correcting the inspected results of the product from each equipment for the number or density of defects, by using the correction factor.
申请公布号 JP2002033252(A) 申请公布日期 2002.01.31
申请号 JP20000218708 申请日期 2000.07.14
申请人 HITACHI LTD 发明人 OKA KENJI;NISHIYAMA HIDETOSHI;MAEDA SHUNJI
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
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