| 摘要 |
PROBLEM TO BE SOLVED: To allow pattern inspection within a coating/developing equipment for a board where a resist pattern is formed and to allow independent use of a built-in pattern inspection equipment. SOLUTION: An inspection station comprising a pattern inspection unit and an auxiliary arm is connected to the side of a carrier station for the coating/ developing equipment. An intermediate mount part is provided, for example, on one side of both stations, for delivery of a wafer between a delivery arm of the carrier station and the auxiliary arm through the intermediate placement part. The wafer developed by the equipment is carried into the inspection station by the delivery arm. At maintenance of a process station, for example, a carrier is carried in the carrier station from outside and the delivery arm is used to carry the wafer in the carrier into the inspection station. |
