| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition method and a film deposition system by which granular impurities are removed, and a film having high quality (densiness) can be deposited at a high yield. SOLUTION: In this film deposition method in which, when depositing a thin film on a substrate 11, a source material 2-1 for film deposition is fed, and, while granular impurities 3 formed by the source material are removed 9, film deposition is performed, the removal of the granular impurities can be performed by a method by photoelectrons 7 or a method by discharge, the photoelectrons 7 are generated by irradiating a photoelectron emitting material 4 with ultraviolet rays, and charged fine particles 8 are collected by an electrode 5.
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