| 摘要 |
PROBLEM TO BE SOLVED: To provide a super-fine particle film of an arbitrary film thickness in a gas deposition apparatus which comprises a super-fine particle generating chamber having an evaporation source and an opening part for a carrying pipe thereabove, and a film forming chamber having a nozzle coupled with other opening part of the carrying pipe and a stage for fixing a substrate disposed facing thereto, carries the super-fine particles evaporated from the evaporation source in the carrying pipe together with the gas introduced into the super- fine particle generating chamber, and forms the film by depositing the super-fine particles ejected from the nozzle on the substrate. SOLUTION: The super-fine particle film 3 is formed on the substrate 4, and the film thickness of the formed super-fine particle film 3 is measured by a laser film thickness measuring instrument by a laser film thickness measuring instrument 5 which is a non-contact type film thickness measuring instrument, and the relative speed between the stage and the nozzle 1, the temperature of the evaporation source, etc., are controlled based on the result of the film thickness measurement.
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