THIN FILM MEASURING APPARATUS AND METHOD AND THIN FILM FORMATION SYSTEM

摘要

PROBLEM TO BE SOLVED: To measure a thin film on site and in real time with very high accuracy which is formed on the surface of each base inside a thin film formation furnace. SOLUTION: A thin film formation system 10 for forming a thin film S1 on the surface of each of thin film bases 24 and 24 arranged within the closed thin film formation furnace 20 has a measuring portion 30 provided in a portion communicating with the furnace 20. The measuring portion 30 has a thin film formation sample base 31 to which a thin film material flowing therein from the furnace 20 adheres. An X-ray incident window 32 and an X-ray exit window 33 are provided in the sidewalls of the measuring portion 30. A thin film measuring apparatus 40 installed outside the furnace 20 applies X-rays to the base 31 of the measuring portion 30 through the X-ray incident window 32. The X-rays reflected by the base 31 are detected through the X-ray exit window 33.