| 摘要 |
<p>PROBLEM TO BE SOLVED: To avoid the blocking of high precision patterning due to the occurrence of projections on a photosensitive material layer in photolithography. SOLUTION: In a photolithographic method including a step for coating the smooth surface 1a of a substrate 1 with a photosensitive material, a step for patternwise exposing the resulting photosensitive material layer 2 and a step for developing the layer 2, the surface of the photosensitive material layer is polished prior to the exposure. By this surface polishing, projections present on the surface of the photosensitive material layer are removed or truncated to avoid non-exposure in a part to be exposed due to the presence of the projections.</p> |
